In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metallization. The etch rate is an impor

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Sample means for solutions 1 and 2 are 19.27 and 10.32 respectively

In semiconductor manufacturing,

The total for answer 1 is given by:

9.7+10.5+9.4+10.6+9.3+10.7+9.6+10.4+10.2+10.5 = 192.7

The sample size is 10 and provides us with

192.7/10 = 19.27

For solution 2, the sum is given by:

10.6+10.3+10.3+10.2+10.0+10.7+10.3+10.4+10.1+10.3 = 103.2

The sample size is 10, this gives us

103.2/10 = 10.32

The total for answer 2 is given by:

10.6+10.3+10.3+10.2+10.0+10.7+10.3+10.4+10.1+10.3 = 103.2

The sample size is 10 and provides us with

103.2/10 = 10.32

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In semiconductor manufacturing, wet chemical etching is often used to remove silicon from the backs of wafers prior to metalization. The etch rate is an important characteristic in this process and is known to follow a normal distribution. Two different etching solutions have been compared, using two random samples of 10 wafers for each solution. Assume the variances are equal. The etch rates are as follows (in mils per minute): Solution 1 Solution 2 9.7 10.6 10.5 10.3 9.4 10.3 10.6 10.2 9.3 10.0 10.7 10.7 9.6 10.3 10.4 10.4 10.2 10.1 10.5 10.3 Calculate sample means of solution 1 and solution 2